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     DC Photomask Applications

    When the lattice sharp is exposed through the photomask on the exposure machine, due to the optical and mechanic characteristics of the exposure machine, it will induce non-ideal lattice shapes of the glass substrate which would affect the accuracy when matching with other layers. DC photomask, based on the exposure characteristics and shapes of each exposure machine as well as the shape errors of array-substrate / CF-substrate, give reverse compensation on production. It makes the exposure results meet the ideal lattice criterion, and enhance the precision of matching.